真空．影像．掃圖式橢偏儀 / 鼎昕科技(股)公司

Vacuum UV Spectroscopic Ellipsometer
VUV range (145 ~ 320 nm), Short nitrogen purge time < 5 mins. Variable angle from 45˚ to 90˚. Application to 193 nm Immersion Lithography. Easy & accurate measurement of thickness and refractive index for very thin films of semiconductor ARC, PR, high k, oxide, nitrie, pellicle and metal

Imaging Ellipsometer
~0.1 nm thickness difference can be seen by IE-1000.(Imaging Ellipsometer) Thickness distribution of thin film can be imaged. Thickness and optical images of semiconductor, display and bio samples.IE-1000 can show the images

Mapping Spectroscopic Ellipsometer
Moving head type (patent pending). Smallest foot print, 5 sec for full spectra of {Δ,Ψ} over 250~840 nm. Multi heads are possible for in-line mass production applications

Spectroscopic Ellipsometer

TOP